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| Home > Product > Glass Substrate |
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Photomask is a pattern used
in the photolithography processing. Photolithography,
applying photography technology, is used to
process minute and precise circuits.
This technology is now one of the key technologies
in the ultra-precise electrical parts industry,
as semiconductor parts are getting more complex
and smaller.
Photolithography is a technology that transfers
patterns from a Photomask to photo-resist
on a substrate, by passing light through photo
mask. The mask transferring at the same size
with the pattern is called a Photomask, and
the mask transferring five times as much as
the pattern is called a Reticle.
Creating new production lines for Photo masks
for large-scale & high-precision TFT LCD,
LG micron plays a leading role in domestic
large-scale Photo Mask market. |
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Photo mask for FPD |
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Ultra-expansion : Because of
expansion of mother glass of LCD panel, the
size of photomask up to 850*1200(mm) for 7th
generation |
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